The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2016

Filed:

Apr. 05, 2012
Applicant:

Martin Schönleber, Aschaffenburg, DE;

Inventor:

Martin Schönleber, Aschaffenburg, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01); G01B 11/22 (2006.01); G01B 9/02 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01B 11/22 (2013.01); G01B 9/02044 (2013.01); G01B 9/02084 (2013.01); G01B 9/02091 (2013.01); H01L 22/12 (2013.01); G01B 2210/56 (2013.01);
Abstract

An apparatus and method for determining a depth of a region having a high aspect ratio that protrudes into a surface of a semiconductor wafer are provided. The apparatus comprises a multi-wavelength light source, a semiconductor wafer holder for holding a semiconductor wafer, a head for directing the light source onto the semiconductor wafer, a spectrometer for collecting light comprising multiple wavelengths reflected from the semiconductor wafer and analysis means for determining a depth of the region from an interference pattern of light reflected from the semiconductor wafer by performing Fourier domain optical coherence tomography.


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