The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2016
Filed:
Jul. 08, 2014
Applicant:
Enplas Corporation, Saitama, JP;
Inventors:
Aki Inada, Saitama, JP;
Noriyuki Kawahara, Saitama, JP;
Assignee:
Enplas Corporation, Saitama, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F21V 3/00 (2015.01); F21V 5/04 (2006.01); F21V 5/08 (2006.01); G02B 3/00 (2006.01); A01G 7/04 (2006.01); F21Y 101/02 (2006.01); F21Y 103/00 (2006.01);
U.S. Cl.
CPC ...
F21V 5/045 (2013.01); A01G 7/045 (2013.01); F21V 5/08 (2013.01); G02B 3/00 (2013.01); F21Y 2101/02 (2013.01); F21Y 2103/003 (2013.01);
Abstract
Incidence regionof light flux controlling memberincludes first lens regionand second lens regionwhich have a fan shape in a plan view thereof. First lens regionincludes a plurality of first projections. In first inclining surfaceof first projection, angle θon a first cross section and angle θon a second cross section in a direction orthogonal to the first cross section are both larger than 0°. In second inclining surface, angle θon the second cross section is larger than angle θon the second cross section.