The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2016
Filed:
Dec. 04, 2012
Applicant:
General Electric Company, Schenectady, NY (US);
Inventors:
Ronald Ralph Cairo, Simpsonville, SC (US);
Jason Robert Parolini, Greer, SC (US);
John McConnell Delvaux, Fountain Inn, SC (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F01D 5/30 (2006.01); F01D 5/14 (2006.01); F01D 5/28 (2006.01);
U.S. Cl.
CPC ...
F01D 5/3092 (2013.01); F01D 5/3084 (2013.01); F01D 5/147 (2013.01); F01D 5/282 (2013.01); F01D 5/284 (2013.01); F01D 5/3007 (2013.01); F05D 2250/711 (2013.01); F05D 2250/712 (2013.01); F05D 2300/6033 (2013.01); Y02T 50/672 (2013.01);
Abstract
An apparatus having reduced wear and friction between CMC-to-metal attachment and interface of the apparatus, including a CMC component having a surface. The CMC component surface is configured for sliding contact with a surface of a metal component, the sliding contact resulting in formation of debris along the contacting surfaces. The surface of the CMC component has an engineered surface feature formed therein to substantially prevent an accumulation of debris along the contacting surfaces.