The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2016
Filed:
Aug. 30, 2011
Atsuro Hama, Tokyo, JP;
Atsuro Hama, Tokyo, JP;
MITSUBISHI ELECTRIC CORPORATION, Tokyo, JP;
Abstract
A plasma deposition apparatus that includes a high-frequency electrode caused to face a deposition target and a ground electrode connected to the deposition target, and deposits a film on the deposition target by using plasma generated between the high-frequency electrode and the ground electrode, wherein the high-frequency electrode includes a first high-frequency electrode caused to face a first deposition target surface of the deposition target, and a second high-frequency electrode caused to face a second deposition target surface on the opposite side of the first deposition target surface, and the first high-frequency electrode, the second high-frequency electrode, and the ground electrode generate plasma between the first high-frequency electrode and the ground electrode for performing deposition on the first deposition target surface and plasma between the second high-frequency electrode and the ground electrode for performing deposition on the second deposition target surface at the same time.