The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2016
Filed:
Jul. 26, 2012
Tomotake Nashiki, Osaka, JP;
Yoshimasa Sakata, Osaka, JP;
Hideo Sugawara, Osaka, JP;
Kenkichi Yagura, Osaka, JP;
Akira Hamada, Osaka, JP;
Yoshihisa Ito, Osaka, JP;
Kuniaki Ishibashi, Osaka, JP;
Tomotake Nashiki, Osaka, JP;
Yoshimasa Sakata, Osaka, JP;
Hideo Sugawara, Osaka, JP;
Kenkichi Yagura, Osaka, JP;
Akira Hamada, Osaka, JP;
Yoshihisa Ito, Osaka, JP;
Kuniaki Ishibashi, Osaka, JP;
NITTO DENKO CORPORATION, Osaka, JP;
Abstract
The film formation method comprises the steps of: unrolling and feeding an elongated substrate wound in a roll form from a first roll chamber in a direction from the first roll chamber toward a second roll chamber, using a first surface as a surface for film formation; degassing the fed substrate; forming a first material film on the first surface of the degassed substrate in a first film formation chamber; forming a second material film on the first material film in a second film formation chamber; taking up the substrate in a roll form in the second roll chamber, the substrate having the material films formed thereon; unrolling and feeding the taken up substrate from the first roll chamber in the direction, using a second surface opposite the first surface of the substrate as a surface for film formation; and repeating all the above treatments.