The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2016

Filed:

Aug. 30, 2013
Applicants:

Huirong Yao, Plainsboro, NJ (US);

Salem K. Mullen, Florham Park, NJ (US);

Elizabeth Wolfer, Bethlehem, PA (US);

Douglas Mckenzie, Easton, PA (US);

Joonyeon Cho, Bridgewater, NJ (US);

Munirathna Padmanaban, Bridgewater, NJ (US);

Inventors:

Huirong Yao, Plainsboro, NJ (US);

Salem K. Mullen, Florham Park, NJ (US);

Elizabeth Wolfer, Bethlehem, PA (US);

Douglas McKenzie, Easton, PA (US);

JoonYeon Cho, Bridgewater, NJ (US);

Munirathna Padmanaban, Bridgewater, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 7/08 (2006.01); G03F 7/075 (2006.01); C09D 185/00 (2006.01); H01L 21/033 (2006.01); C08G 77/58 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
C09D 185/00 (2013.01); C07F 7/08 (2013.01); C08G 77/58 (2013.01); G03F 7/0752 (2013.01); G03F 7/091 (2013.01); G03F 7/094 (2013.01); H01L 21/0332 (2013.01); H01L 21/0337 (2013.01); H01L 21/0338 (2013.01);
Abstract

The present invention relates to novel, soluble, multi-ligand-substituted metal oxide compounds to form metal oxide films with improved stability as well as compositions made from them and methods of their use. Specifically, the invention pertains to compounds having the following structure (I) wherein M is a metal and n is 1 to 20, and wherein at least one of R, R, R, and Ris i) and at least at least one of R, R, R, and Ris ii), where i) is a silicon bearing organic moiety having at least 2 carbons, and ii) is an organic moiety. The invention also relates to spin-coatable compositions of compounds of structure (I) dissolved into a solvent. The present invention further relates to processes using this spin coatable composition to form a coating on a patterned substrate.


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