The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2016

Filed:

Aug. 15, 2013
Applicant:

Mitsubishi Rayon Co., Ltd., Tokyo, JP;

Inventors:

Atsushi Yasuda, Yokohama, JP;

Tomoya Oshikiri, Yokohama, JP;

Daisuke Matsumoto, Yokohama, JP;

Keisuke Katou, Yokohama, JP;

Shinichi Maeda, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 24/00 (2006.01); C08F 297/02 (2006.01); C08F 2/00 (2006.01); G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/085 (2006.01);
U.S. Cl.
CPC ...
C08F 24/00 (2013.01); C08F 2/00 (2013.01); C08F 297/026 (2013.01); C08F 2500/06 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/039 (2013.01); G03F 7/0397 (2013.01); G03F 7/085 (2013.01);
Abstract

A copolymer obtained by polymerizing two or more types of monomers, wherein among fractions obtained by dividing an eluate showing peaks relative to the copolymer, in an elution curve obtained by gel permeation chromatography (GPC), into eight fractions in order of fractionation, such that each fraction has the same volume, a difference between a monomer composition ratio of a copolymer contained in a first eluted fraction and a monomer composition ratio of all copolymers is −3 mol % to +3 mol % in any of the constitutional units derived from the respective monomers.


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