The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2016
Filed:
Feb. 08, 2013
Honeywell International, Inc., Morristown, NJ (US);
Haiyou Wang, Amherst, NY (US);
Hsueh S. Tung, Getzville, NY (US);
Haluk Kopkalli, Staten Island, NY (US);
Yuon Chiu, Denville, NJ (US);
Gustavo Cerri, Parsippany, NJ (US);
Jeffrey Ball, Morisstown, NJ (US);
Philip L. Da Prato, Annandale, NJ (US);
Xuehui Sun, Kennet Square, PA (US);
Mario Joseph Nappa, Newark, DE (US);
THE CHEMOURS COMPANY FC, LLC, Wilmington, DE (US);
Abstract
A method for forming 2,3,3,3-tetrafluoropropene (HFO-1234yf) comprising providing a dehydrochlorination starting material having relatively low concentrations of 2-chloro-3,3,3-trifluoropropene (HCFO-1233xf), especially and preferable less than about 8.0% when the dehydrochlorination reaction utilizes no substantial amount of catalyst or catalyst comprising austenitic nickel-based materials.