The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2016

Filed:

Feb. 04, 2014
Applicant:

Invensense, Inc., San Jose, CA (US);

Inventors:

Kirt Reed Williams, Portola Valley, CA (US);

Matthew Julian Thompson, Beaverton, OR (US);

Joseph Seeger, Menlo Park, CA (US);

Assignee:

INVENSENSE, INC., San Jose, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01P 15/08 (2006.01); B81B 3/00 (2006.01); G01N 3/20 (2006.01); G01P 15/125 (2006.01); B81C 1/00 (2006.01); G01K 1/00 (2006.01);
U.S. Cl.
CPC ...
B81B 3/0051 (2013.01); B81C 1/00666 (2013.01); G01K 1/00 (2013.01); G01N 3/20 (2013.01); G01P 15/125 (2013.01); B81B 2201/0221 (2013.01); B81B 2201/0235 (2013.01); B81B 2201/0271 (2013.01);
Abstract

A method and system for a MEMS device is disclosed. The MEMS device includes a free layer, with a first portion and a second portion. The MEMS device also includes a underlying substrate, the free layer movably positioned relative to the underlying substrate. The first portion and second portion of the free layer are coupled through at least one stem. A sense material is disposed over portions of the second portion of the free layer. Stress in the sense material and second portion of the free layer does not cause substantial deflection of the first portion.


Find Patent Forward Citations

Williams, Kirt. (2016). Mems device with a stress-isolation structure (U.S. Patent No. 9296606). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9296606

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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