The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2016
Filed:
Jan. 12, 2012
Adrian S. Eckert, Herrsching, DE;
Michael M. Cub, Munich, DE;
Bettina Hailand, Herrsching a Ammersee, DE;
Marion B. Kestel, Munich, DE;
Karsten Dede, Landsberg, DE;
Uwe H. Hoheisel, Turkenfeld, DE;
Gioacchino Raia, Turkenfeld, DE;
Christoph Thalacker, Weilheim, DE;
Reinhold Hecht, Kaufering, DE;
Thomas Luchterhandt, Pleidelsheim, DE;
Adrian S. Eckert, Herrsching, DE;
Michael M. Cub, Munich, DE;
Bettina Hailand, Herrsching a Ammersee, DE;
Marion B. Kestel, Munich, DE;
Karsten Dede, Landsberg, DE;
Uwe H. Hoheisel, Turkenfeld, DE;
Gioacchino Raia, Turkenfeld, DE;
Christoph Thalacker, Weilheim, DE;
Reinhold Hecht, Kaufering, DE;
Thomas Luchterhandt, Pleidelsheim, DE;
3M INNOVATIVE PROPERTIES COMPANY, Saint Paul, MN (US);
Abstract
The invention relates to a dental composition having a) compound (A) with the following features: only one backbone unit (U) with 6 to 20 carbon atoms, at least 6 carbon atoms thereof forming an aromatic or an aliphatic cyclic moiety, the remaining carbon atoms either being part of substituents pending from the cyclic moiety or being part of bridging groups to spacer units, wherein one or more of the remaining carbon atoms can be replaced by an oxygen atom, the backbone unit not comprising a bisphenol structure,one or two spacer unit(s) (S) being connected to the backbone unit (U) via an ether linkage, at least one spacer unit (S) having a —CH2-CH2-CH2-CH2-O-CH2-CH(Q)-OG chain or a —CH2-CH(OG)-CH2-OM residue or a mixture of these two types of spacers within one spacer unit,with G having at least one group selected from acroyl, methacroyl, acetyl, benzoyl, and combinations thereof, M having at least one aryl group, and combinations thereof, Q having at least one group selected from hydrogen, methyl, phenyl, phenoxymethyl, and combinations thereof,b) filler (B) and c) initiator (C).