The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2016

Filed:

Dec. 28, 2012
Applicant:

Furukawa Electric Co., Ltd., Chiyoda-ku, Tokyo, JP;

Inventors:

Toshio Tani, Tokyo, JP;

Kiyoshi Yoshinari, Tokyo, JP;

Akitoshi Suzuki, Tokyo, JP;

Kensaku Shinozaki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01M 4/66 (2006.01); H01M 4/04 (2006.01); H01M 4/134 (2010.01); H01M 4/1395 (2010.01); H01M 4/36 (2006.01); H01M 4/70 (2006.01); H01M 10/052 (2010.01);
U.S. Cl.
CPC ...
H01M 4/661 (2013.01); H01M 4/0404 (2013.01); H01M 4/134 (2013.01); H01M 4/1395 (2013.01); H01M 4/364 (2013.01); H01M 4/70 (2013.01); H01M 10/052 (2013.01); Y02E 60/122 (2013.01); Y02T 10/7011 (2013.01);
Abstract

A chargeable and dischargeable secondary battery for use in electronic devices, industrial machines, electric-powered vehicles, is provided, along with an anodic electrode and a copper foil for anode current collector. It is an anode for secondary battery that utilizes non-aqueous electrolyte, which comprises a silicon-type active material film formed on one side or both sides of a current collector made of copper foil or copper alloy foil, wherein 1 g/mto 14 g/mof silicon-type active material film is formed on said current collector, and the lightness Y value in a XYZ colorimetric system (CIE 1931 standard colorimetric system) for the surface of said anode, onto which said silicon-type active material film is formed, is 15 to 50, and the surface roughness (ten point average roughness) Rz specified by the Japanese Industrial Standards (JIS B0601-1994 ten point average roughness) is 1.0 μm or more and 4.5 μm or less.


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