The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2016
Filed:
Dec. 20, 2012
Applicant:
E I Du Pont DE Nemours and Company, Wilmington, DE (US);
Inventors:
Adam Fennimore, Wilmington, DE (US);
Steven R. Mackara, Townsend, DE (US);
Assignee:
E I DU PONT DE NEMOURS AND COMPANY, Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 51/56 (2006.01); H01L 51/00 (2006.01); G03F 7/20 (2006.01); H01L 51/50 (2006.01);
U.S. Cl.
CPC ...
H01L 51/56 (2013.01); G03F 7/2022 (2013.01); H01L 51/0003 (2013.01); H01L 51/0012 (2013.01); H01L 51/0015 (2013.01); H01L 51/0018 (2013.01); H01L 51/0035 (2013.01); H01L 51/5088 (2013.01); H01L 2251/5369 (2013.01);
Abstract
There is provided a process for forming a contained second layer over a first layer, including the steps:
Fennimore, Adam. (2016). Process and materials for making contained layers and devices made with same (U.S. Patent No. 9293739). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9293739
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile