The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2016

Filed:

Oct. 31, 2014
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Brian A. Bryce, Chevy Chase, MD (US);

Josephine B. Chang, Mahopac, NY (US);

Matthew W. Copel, Yorktown Heights, NY (US);

Marcelo A. Kuroda, Auburn, AL (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/84 (2006.01); H01L 41/107 (2006.01); H01L 41/314 (2013.01); H01L 41/332 (2013.01); H01L 41/083 (2006.01);
U.S. Cl.
CPC ...
H01L 41/107 (2013.01); H01L 41/083 (2013.01); H01L 41/314 (2013.01); H01L 41/332 (2013.01);
Abstract

A method of forming a piezoelectronic transistor (PET) device, the PET device, and a semiconductor including the PET device are described. The method includes forming a first metal layer, forming a layer of a piezoelectric (PE) element on the first metal layer, and forming a second metal layer on the PE element. The method also includes forming a well above the second metal layer, forming a piezoresistive (PR) material in the well and above the well, and forming a passivation layer and a top metal layer above the PR material at the diameter of the PR material above the well, wherein a cross sectional shape of the well, the PR material above the well, the passivation layer, and the top metal layer is a T-shaped structure. The method further includes forming a metal clamp layer as a top layer of the PET device.


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