The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2016

Filed:

Apr. 16, 2014
Applicant:

Panasonic Corporation, Osaka, JP;

Inventors:

Hideyuki Okita, Toyama, JP;

Yasuhiro Uemoto, Toyama, JP;

Masahiro Hikita, Toyama, JP;

Akihiko Nishio, Ishikawa, JP;

Hidenori Takeda, Nara, JP;

Takahiro Sato, Toyama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/423 (2006.01); H01L 29/778 (2006.01); H01L 29/06 (2006.01); H01L 29/20 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/78 (2013.01); H01L 29/0657 (2013.01); H01L 29/42316 (2013.01); H01L 29/66431 (2013.01); H01L 29/66462 (2013.01); H01L 29/7787 (2013.01); H01L 29/1066 (2013.01); H01L 29/2003 (2013.01);
Abstract

A semiconductor device includes: a first nitride semiconductor layer; a second nitride semiconductor layer above the first nitride semiconductor layer and having a band gap larger than that of the first nitride semiconductor layer; a p-type nitride semiconductor layer above the second nitride semiconductor layer; two third nitride semiconductor layers of n-type above the second nitride semiconductor layer and located separately on either side of the p-type nitride semiconductor layer; and a first ohmic electrode above one of the two third nitride semiconductor layers and a second ohmic electrode above the other of the two third nitride semiconductor layers; and a gate electrode above the p-type nitride semiconductor layer. The second nitride semiconductor layer includes, in a region above which neither the p-type nitride semiconductor layer nor the two third nitride semiconductor layers is located, a surface layer including p-type impurities identical to those in the p-type nitride semiconductor layer.


Find Patent Forward Citations

Loading…