The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2016

Filed:

Oct. 15, 2013
Applicant:

X-fab Semiconductor Foundries Ag, Erfurt, DE;

Inventors:

Brendan Toner, Kuching, MY;

Xuezhou Cao, Plymouth, GB;

Fred Fang, Kuching, MY;

Chuan Chien Tan, Kuching, MY;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/73 (2006.01); H01L 29/40 (2006.01); H01L 29/66 (2006.01); H01L 29/732 (2006.01);
U.S. Cl.
CPC ...
H01L 29/73 (2013.01); H01L 29/402 (2013.01); H01L 29/66272 (2013.01); H01L 29/66295 (2013.01); H01L 29/7322 (2013.01);
Abstract

A bipolar junction transistor is provided with an emitter region, an oxide region, a base region and a collector region. The base region is located between the emitter region and the oxide region and has a junction with the emitter region and an interface with the oxide region. An at least partially conductive element such as metal or silicon is positioned to overlap with at least part of the junction between the base region and the emitter region, thereby forming a gate. The gate also overlaps with at least part of the interface between the base region and the oxide region. When a suitable bias voltage is applied to the gate, the gain of the transistor can be increased.


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