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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9293352 B1

PDFFull Text
Date of Patent:
Mar. 22, 2016

Filed:

Aug. 21, 2012

Substrate processing method

Applicants:

Akio Hashizume, Kyoto, JP;

Yuya Akanishi, Kyoto, JP;

Inventors:

Akio Hashizume, Kyoto, JP;

Yuya Akanishi, Kyoto, JP;

Assignee:

SCREEN Holdings Co., Ltd., , JP;

Attorney:

Ostrolenk Faber LLP

Primary Examiner:

Binh X Tran

Assistant Examiner:

David Cathey, Jr

Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67028 (2013.01); H01L 21/0206 (2013.01); H01L 21/02381 (2013.01); H01L 21/02488 (2013.01); H01L 21/02532 (2013.01); H01L 21/02658 (2013.01); H01L 21/306 (2013.01);
Abstract

In a substrate processing apparatus (), a silicon oxide film on a main surface of a substrate () is removed in an oxide film removing part () and then a silylation material is applied to the main surface, to thereby perform a silylation process in a silylation part (). It is thereby possible to lengthen the Q time from the removal of the silicon oxide film to the formation of the silicon germanium film and reduce the temperature for prebaking in the formation of the silicon germanium film.

Find Patent Forward Citations

Hashizume, Akio. (2016). Substrate processing method (U.S. Patent No. 9293352). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9293352

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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