The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2016
Filed:
Jun. 05, 2013
Beijing Boe Optoelectronics Technology Co., Ltd., Beijing, CN;
Boe Technology Group Co., Ltd., Beijing, CN;
Lei Chen, Beijing, CN;
Ziqi Xia, Beijing, CN;
Wukun Dai, Beijing, CN;
Jiapeng Li, Beijing, CN;
Xiuhong Jin, Beijing, CN;
Fengguo Wang, Beijing, CN;
Lei Zhang, Beijing, CN;
Miao Qiu, Beijing, CN;
BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
Abstract
A surface planarization method of thin film and a preparing method of an array substrate relate to a display field, and can solve the technical problem that the conventional dry etching severely damages the surface flatness of other film layers below the one being etched, thereby improving the display properties of the LCD. The preparing method of the array substrate comprises patterning a non-metallic layer () by a dry etching. And following the step of patterning a non-metallic layer () by the dry etching, the method further comprises performing surface planarization on a first film layer () to recover the first film layer () with a rough surface caused by the dry etching to be planar. The first film layer () is located below the non-metallic layer ().