The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2016
Filed:
Jul. 08, 2010
Haiyang Yu, Shanghai, CN;
Ying Zeng, Fremont, CA (US);
Chihhe Chiu, San Francisco, CA (US);
Richard Choi, San Francisco, CA (US);
Agnes Dimayuga, Mountain View, CA (US);
Cheng HU, Palo Alto, CA (US);
Martin Orsag, Brno, CZ;
Xing Zhao, Shanghai, CN;
Donghua Zhou, Shanghai, CN;
Haiyang Yu, Shanghai, CN;
Ying Zeng, Fremont, CA (US);
Chihhe Chiu, San Francisco, CA (US);
Richard Choi, San Francisco, CA (US);
Agnes DiMayuga, Mountain View, CA (US);
Cheng Hu, Palo Alto, CA (US);
Martin Orsag, Brno, CZ;
Xing Zhao, Shanghai, CN;
Donghua Zhou, Shanghai, CN;
SAP SE, Walldorf, DE (US);
Abstract
Particular embodiments generally relate to providing risk management. In one embodiment, a first risk is linked to an account group assertion in a data structure. A second risk is linked to a control objective in the data structure. Access to the first risk is granted through the account group's assertion. Access to the second risk is granted through the control objective. Risk management is then performed using the accessed first risk and second risk.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile