The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2016
Filed:
Jul. 02, 2014
Canon Kabushiki Kaisha, Tokyo, JP;
Koichiro Tsujita, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The present invention provides a method of forming a detection mark from line patterns formed on a substrate, including a first step of deciding a first region for forming the detection mark on the substrate, and a second region which surrounds the first region and in which formation of the detection mark is forbidden, and a second step of projecting, onto the substrate by a projection optical system, patterns including a first cut pattern for partially cutting the line pattern in the first region to form a plurality of mark elements, and a removal pattern for removing the line pattern in the second region, and forming the detection mark including the plurality of mark elements.