The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2016
Filed:
Jan. 29, 2015
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Gustavo A. Stolovitzky, Riverdale, NY (US);
Deqiang Wang, Ossining, NY (US);
Assignee:
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12Q 1/68 (2006.01); B82Y 15/00 (2011.01); B82Y 40/00 (2011.01); B81C 1/00 (2006.01); B82Y 5/00 (2011.01);
U.S. Cl.
CPC ...
C12Q 1/6874 (2013.01); B81C 1/00087 (2013.01); B82Y 15/00 (2013.01); B82Y 40/00 (2013.01); C12Q 1/6869 (2013.01); B82Y 5/00 (2013.01); Y10S 977/723 (2013.01); Y10S 977/74 (2013.01); Y10S 977/742 (2013.01); Y10S 977/781 (2013.01); Y10S 977/904 (2013.01); Y10S 977/92 (2013.01); Y10S 977/953 (2013.01); Y10S 977/958 (2013.01);
Abstract
A technique is provided for a structure. A substrate has a nanopillar vertically positioned on the substrate. A bottom layer is formed beneath the substrate. A top layer is formed on top of the substrate and on top of the nanopillar, and a cover layer covers the top layer and the nanopillar. A window is formed through the bottom layer and formed through the substrate, and the window ends at the top layer. A nanopore is formed through the top layer by removing the cover layer and the nanopillar.