The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2016
Filed:
Jan. 22, 2013
Technical Institute of Physics and Chemistry of the Chinese Academy of Sciences, Beijing, CN;
Yi Li, Beijing, CN;
Qingshan Hao, Beijing, CN;
Jinping Chen, Beijing, CN;
Yi Zeng, Beijing, CN;
Tianjun Yu, Beijing, CN;
Abstract
Disclosed is a molecular glass of a spirofluorene derivative having a molecular structure as follows: formula (I), wherein each of R-Ris a hydrogen atom, a hydroxyl group, a methoxyl group or an acid-sensitive substituent; substituents R˜Rcan be identical or different, but on the same benzene ring the substituents cannot all be hydrogen atoms. The molecular glass has a good solubility in various polar solvents, is suitable to be made into a film; meanwhile the molecular glass has a very high glass transition temperature and meets the requirements of the photolithography processing technology. Also disclosed is a preparation method of the above-mentioned molecular glass of a spirofluorene derivative. The synthetic process of the method is simple and suitable for industrialization. Further disclosed is the use of a photo-resist with the above-mentioned molecular glass as a main material in photo-etching, wherein the molecular glass of a spirofluorene derivative with hydroxyl groups (or partly with hydroxyl groups) on the periphery thereof can be used as a negative photo-resist, and the molecular glass with the hydroxyl groups on the periphery thereof protected (or partly protected) by an acid-sensitive substituent can be used as a positive photo-resist.