The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2016

Filed:

Jun. 03, 2013
Applicant:

Japan Aviation Electronics Industry, Limited, Tokyo, JP;

Inventors:

Akinobu Sato, Tokyo, JP;

Akiko Suzuki, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B26D 1/00 (2006.01); C03B 33/10 (2006.01); B28D 1/22 (2006.01);
U.S. Cl.
CPC ...
B26D 1/0006 (2013.01); B28D 1/225 (2013.01); C03B 33/105 (2013.01); B26D 2001/002 (2013.01); B26D 2001/0053 (2013.01); Y02P 40/57 (2015.11); Y10T 83/929 (2015.04);
Abstract

Two surfaces forming a cutting edge and a ridge of a cutting edge existing along the boundary between the two surfaces intersecting with each other are irradiated with a gas cluster ion beam at the same time, the maximum height of the profile of the two surfaces being equal to or smaller than 1 μm. A facet is newly formed on the ridge of the cutting edge by performing the irradiation with the gas cluster ion beam in such a manner that the two surfaces are not perpendicularly but obliquely irradiated with the gas cluster ion beam, and at least a part of the ridge of the cutting edge is perpendicularly irradiated with the gas cluster ion beam.


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