The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2016
Filed:
Jul. 26, 2013
Oerlikon Surface Solutions Ag, Trübbach, Trübbach, CH;
Carlos Ribeiro, Ho Chi Minh, VN;
Oerlikon Surface Solutions AG, Trübbach, Trübbach, CH;
Abstract
A system for the radiation treatment of substrates, which comprises, in a chamber above the substrate holders for fitting substrates to be treated, at least one radiation source, and wherein the chamber comprises means for maintaining a gas flow in the chamber with at least one gas inlet and at least one gas outlet, characterized in that the at least one gas inlet is disposed in the region of the substrate holders in such a way that gas flowing in through the at least one gas inlet first flows around the substrate holders prior to leaving the chamber again, either directly and/or after flowing around the at least one radiation source, through the gas outlet.