The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9287426 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 15, 2016

Filed:

Sep. 29, 2014
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Nestor A. Bojarczuk, Poughkeepsie, NY (US);

Talia S. Gershon, White Plains, NY (US);

Supratik Guha, Chappaqua, NY (US);

Byungha Shin, Daejeon, KR;

Yu Zhu, West Harrison, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/18 (2006.01); H01L 31/032 (2006.01); H01L 31/0368 (2006.01);
U.S. Cl.
CPC ...
H01L 31/0326 (2013.01); H01L 31/0368 (2013.01); H01L 31/18 (2013.01);
Abstract

Techniques for epitaxial growth of CZT(S,Se) materials on Si are provided. In one aspect, a method of forming an epitaxial kesterite material is provided which includes the steps of: selecting a Si substrate based on a crystallographic orientation of the Si substrate; forming an epitaxial oxide interlayer on the Si substrate to enhance wettability of the epitaxial kesterite material on the Si substrate, wherein the epitaxial oxide interlayer is formed from a material that is lattice-matched to Si; and forming the epitaxial kesterite material on a side of the epitaxial oxide interlayer opposite the Si substrate, wherein the epitaxial kesterite material includes Cu, Zn, Sn, and at least one of S and Se, and wherein a crystallographic orientation of the epitaxial kesterite material is based on the crystallographic orientation of the Si substrate. A method of forming an epitaxial kesterite-based photovoltaic device and an epitaxial kesterite-based device are also provided.


Find Patent Forward Citations

Bojarczuk, Nestor. (2016). Epitaxial growth of czt(s,se) on silicon (U.S. Patent No. 9287426). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9287426

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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