The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2016

Filed:

Aug. 26, 2014
Applicant:

Hyundai Motor Company, Seoul, KR;

Inventors:

Dae Hwan Chun, Gyeonggi-Do, KR;

Kyoung-Kook Hong, Gyeonggi-Do, KR;

Jong Seok Lee, Gyeonggi-Do, KR;

Junghee Park, Gyeonggi-Do, KR;

Youngkyun Jung, Seoul, KR;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 51/40 (2006.01); H01L 29/872 (2006.01); H01L 21/04 (2006.01); H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 29/16 (2006.01);
U.S. Cl.
CPC ...
H01L 29/872 (2013.01); H01L 21/046 (2013.01); H01L 21/0495 (2013.01); H01L 29/0623 (2013.01); H01L 29/6606 (2013.01); H01L 29/1608 (2013.01);
Abstract

A Schottky barrier diode includes: an n− type epitaxial layer disposed on a first surface of an n+ type silicon carbide substrate; a first p+ region disposed on the n− type epitaxial layer; an n type epitaxial layer disposed on the n− type epitaxial layer and the first p+ region; a second p+ region disposed on the n type epitaxial layer, and being in contact with the first p+ region; a Schottky electrode disposed on the n type epitaxial layer and the second p+ region; and an ohmic electrode disposed on a second surface of the n+ type silicon carbide substrate. Also, the first p+ region has a lattice shape including a plurality of vertical portions and horizontal portions connecting both ends of the respective vertical portions to each other.


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