The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2016

Filed:

Mar. 14, 2013
Applicant:

Silicon Laboratories Inc., Austin, TX (US);

Inventors:

Bruce P. Del Signore, Hollis, NH (US);

John O. O'Connell, Mallow, IE;

Assignee:

Silicon Laboratories Inc., Austin, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/552 (2006.01); G01N 27/22 (2006.01); G01D 5/24 (2006.01); G01D 11/24 (2006.01);
U.S. Cl.
CPC ...
H01L 23/552 (2013.01); G01D 5/24 (2013.01); G01N 27/223 (2013.01); G01D 11/245 (2013.01); H01L 2924/0002 (2013.01);
Abstract

Stacked layers of non-continuous opaque layer structures are disclosed herein that may be configured to block radiation such as visible light or other forms of light, while at the same time allowing penetration of ambient gases. In one example, such non-continuous opaque layer structures may be configured as stacked non-continuous metal layer structures that together fully block penetration of radiation while at the same provide sufficient open spaces between and/or within the metal layer segments of a given integrated circuit layer to meet maximum metal spacing rules. In another example, such non-continuous opaque layer structures may be configured as capacitive structures.


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