The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2016

Filed:

Feb. 02, 2012
Applicants:

Thomas Koehler, Norderstedt, DE;

Ewald Rössl, Ellerau, DE;

Inventors:

Thomas Koehler, Norderstedt, DE;

Ewald Rössl, Ellerau, DE;

Assignee:

KONINKLIJKE PHILIPS N.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 5/00 (2006.01); G21K 1/06 (2006.01); A61B 6/00 (2006.01); A61B 6/04 (2006.01);
U.S. Cl.
CPC ...
G21K 1/067 (2013.01); A61B 6/4035 (2013.01); A61B 6/4291 (2013.01); A61B 6/484 (2013.01); G21K 1/06 (2013.01); A61B 6/0407 (2013.01); A61B 6/4078 (2013.01); A61B 6/4441 (2013.01); A61B 6/508 (2013.01); G21K 2201/067 (2013.01); G21K 2207/005 (2013.01);
Abstract

In X-ray differential phase-contrast imaging. In order to enhance the information acquired by phase-contrast imaging, an analyzer grating () is provided with an absorption structure (). The latter includes a first plurality () of first areas () with a first X-ray attenuation, and a second plurality () of second areas () with a second X-ray attenuation. The second X-ray attenuation is smaller than the first X-ray attenuation, and the first and second areas are arranged periodically in an alternating manner. A third plurality () of third areas () is provided with a third X-ray attenuation, which lies in a range from the second X-ray attenuation to the first X-ray attenuation, wherein every second of the first or second areas is replaced by one of the third areas.


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