The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2016
Filed:
May. 24, 2013
Rawles Llc, Wilmington, DE (US);
Eric Wang, Cupertino, CA (US);
Renwei Yan, Sunnyvale, CA (US);
Christopher David Coley, Morgan Hill, CA (US);
Ronald Joseph Degges, Jr., Los Gatos, CA (US);
Louis Leroi Legrand, III, Seattle, WA (US);
Amazon Technologies, Inc., Seattle, WA (US);
Abstract
Described herein are systems and devices for mitigating multi-path interference in optical time-of-flight systems. An input surface is configured with a pattern comprising predominately low albedo material and a plurality of decimated high albedo features. The low albedo material is configured to minimize reflectance of light emitted by an emitter. The high albedo material is configured to reflect more of the light than the low albedo material. The low and high albedo materials, or an additional material, may be used to provide a high albedo material in visible light wavelengths, configured for use as a projection surface.