The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2016
Filed:
Mar. 27, 2015
Canon Kabushiki Kaisha, Tokyo, JP;
Nozomu Izumi, Utsunomiya, JP;
Kouhei Nagano, Saitama, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An exposure apparatus comprises a first detector detecting substrate-side marks via an original-side mark and a projection optical system; second detectors arranged in a larger number than the first detector and detecting the substrate-side marks not via the projection optical system; a reference plate having reference marks; and a control unit configured to obtain a first detection result of the plurality of reference marks by the second detectors, obtain first information relating to a first distance between the plurality of second detectors based on the first detection result, obtain a second detection result of the identical substrate-side mark by the first detector and the second detectors, obtain second information relating to a second distance between the first detector and the second detectors based on the second detection result, and control the alignment of the original and the substrate based on the first information and the second information.