The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2016

Filed:

Dec. 12, 2013
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Beijing Boe Display Technology Co., Ltd., Beijing, CN;

Inventors:

Lingyu Sun, Beijing, CN;

Hongli Zhu, Beijing, CN;

Xiuyun Chen, Beijing, CN;

Dae Keun Yoon, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 7/09 (2006.01); G02B 5/10 (2006.01); G02F 1/1335 (2006.01); F21V 7/00 (2006.01); F21V 8/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/10 (2013.01); G02F 1/133615 (2013.01); F21V 7/0025 (2013.01); F21V 7/09 (2013.01); G02B 6/0055 (2013.01); G02B 6/0061 (2013.01); G02B 6/0096 (2013.01);
Abstract

The present invention provides a back cover for a backlight source, a backlight source and a display apparatus. The back cover includes at least one reflection surface arranged on one surface of the back cover. The reflection surface includes a first reflection region and a second reflection region, each of which includes a plurality of concave arc-shaped regions. The concave arc-shaped regions of the first reflection region have curvature increasing toward the second reflection region, and the concave arc-shaped regions of the second reflection region have curvatures decreasing in a direction away from the first reflection region. The concave arc-shaped region having a maximum curvature in the first reflection region is connected with the concave arc-shaped region having a maximum curvature in the second reflection region.


Find Patent Forward Citations

Loading…