The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2016

Filed:

Apr. 24, 2015
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Binquan Luan, Chappaqua, NY (US);

Sung-wook Nam, Croton-on-Hudson, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C12Q 1/68 (2006.01); G01N 27/414 (2006.01); G01N 27/447 (2006.01);
U.S. Cl.
CPC ...
G01N 27/4145 (2013.01); C12Q 1/6869 (2013.01); G01N 27/44791 (2013.01);
Abstract

A technique includes providing a nanodevice. A gate electrode structure has nanochannels with a first end connected to a first common trench and a second end connected to a second common trench. A gate electrode extends laterally as a continuous line on the gate electrode structure and is formed in each of the nanochannels. The gate electrode forms a separate nano-ring electrode around a partial circumference inside each of the nanochannels. The gate electrode is parallel to the first and second common trenches and is perpendicular to the nanochannels.


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