The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2016

Filed:

Mar. 23, 2011
Applicants:

David M. King, Longmont, CO (US);

Alan W. Weimer, Niwot, CO (US);

Paul Lichty, Westminster, CO (US);

Inventors:

David M. King, Longmont, CO (US);

Alan W. Weimer, Niwot, CO (US);

Paul Lichty, Westminster, CO (US);

Assignee:

Pneumaticoat Technologies LLC, Westminster, CO (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/44 (2006.01); C04B 41/00 (2006.01); C04B 41/45 (2006.01); C04B 41/81 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); C23C 16/442 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4417 (2013.01); C04B 41/009 (2013.01); C04B 41/4584 (2013.01); C04B 41/81 (2013.01); C23C 16/402 (2013.01); C23C 16/403 (2013.01); C23C 16/405 (2013.01); C23C 16/407 (2013.01); C23C 16/442 (2013.01); C23C 16/45525 (2013.01); C23C 16/45555 (2013.01);
Abstract

A reactor for conducting vapor phase deposition process is disclosed. The reactor includes a reactive precursor reservoir beneath a powder reservoir and separated from it by valve means. A reactive precursor is charged into the reactive precursor reservoir and a powder is charged into the powder reservoir. The pressures are adjusted so that the pressure in the reactive precursor reservoir is higher than that of the powder reservoir. The valve means is opened, and the vapor phase reactant fluidized the powder and coats its surface. The powder falls into the reactive precursor reservoir. The apparatus permits vapor phase deposition processes to be performed semi-continuously.


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