The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2016

Filed:

Jun. 13, 2007
Applicant:

Ari Kärkkäinen, Oulu, FI;

Inventor:

Ari Kärkkäinen, Oulu, FI;

Assignee:

Braggone Oy, Oulu, FI;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 77/16 (2006.01); C09B 69/10 (2006.01); C08G 77/04 (2006.01); C09B 69/00 (2006.01); C09D 183/04 (2006.01); G03F 7/075 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
C09B 69/10 (2013.01); C08G 77/04 (2013.01); C09B 69/008 (2013.01); C09D 183/04 (2013.01); G03F 7/0752 (2013.01); G03F 7/091 (2013.01);
Abstract

An organic-inorganic composition, which has a backbone containing —Si—O— units with chromophore groups attached directly to at least a part of the silicon atoms. The film forming composition and resulting coating properties can be tailored to suit the specific exposure wavelength and device fabrication and design requirements. By using two different chromophores the refractive index and the absorption co-efficient can be efficiently tuned and a desired Si-content of the anti-reflective coating composition can be obtained—a high Si-content will give good mechanical and thermal properties and also the required wet etch and dry etch properties.


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