The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2016
Filed:
Dec. 27, 2013
Applicant:
Silevo, Inc., Fremont, CA (US);
Inventors:
Zhigang Xie, San Jose, CA (US);
Wei Wang, San Jose, CA (US);
Zheng Xu, Pleasanton, CA (US);
Jianming Fu, Palo Alto, CA (US);
Assignee:
SolarCity Corporation, San Mateo, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01J 37/34 (2006.01); H01L 31/18 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01L 31/1876 (2013.01); C23C 14/3407 (2013.01); H01J 37/32082 (2013.01); H01J 37/342 (2013.01); H01J 37/345 (2013.01); H01J 37/3405 (2013.01); H01J 37/347 (2013.01); H01J 37/3417 (2013.01); H01J 37/3423 (2013.01); H01J 37/3438 (2013.01); H01J 37/3444 (2013.01); H01J 37/3452 (2013.01); H01L 31/1884 (2013.01); Y02E 10/50 (2013.01);
Abstract
One embodiment of the present invention provides a sputtering system for large-scale fabrication of solar cells. The sputtering system includes a reaction chamber, a rotary target situated inside the reaction chamber which is capable of rotating about a longitudinal axis, and an RF power source coupled to at least one end of the rotary target to enable RF sputtering. The length of the rotary target is between 0.5 and 5 meters.