The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2016

Filed:

Jul. 26, 2012
Applicants:

Seok Min Kang, Seoul, KR;

Moo Seong Kim, Seoul, KR;

Inventors:

Seok Min Kang, Seoul, KR;

Moo Seong Kim, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01); H01L 21/02 (2006.01); C30B 33/02 (2006.01); C30B 35/00 (2006.01); C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02656 (2013.01); C30B 33/02 (2013.01); C30B 35/00 (2013.01); H01L 21/02529 (2013.01); C23C 16/54 (2013.01); H01L 21/0262 (2013.01);
Abstract

A method for fabricating a wafer according to the embodiment comprises the steps of depositing an epi layer in an epi deposition part; transferring the wafer to an annealing part connected to the epi deposition part; annealing the wafer in the annealing part; transferring the wafer to a cooling part connected to the annealing part; and cooling the wafer in the cooling part, wherein the depositing of the wafer, the annealing of the wafer and the cooling of the wafer are continuously performed. An apparatus for fabricating a wafer according to the embodiment comprises an epi deposition part; an annealing part connected to the epi deposition part; and a cooling part connected to the annealing part.


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