The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2016

Filed:

Nov. 05, 2010
Applicant:

Shinichi Hirano, Utsunomiya, JP;

Inventor:

Shinichi Hirano, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70775 (2013.01); G03F 7/7075 (2013.01); G03F 7/70725 (2013.01); H01L 21/67748 (2013.01);
Abstract

An exposure apparatus comprises: a substrate stage movable from a first position to a second position; a conveyance arm movable from a third position to the second position; an elevating member transferring the substrate to the arm at the second position; and a controller. The controller judges whether the stage reaches a fourth position that shifts to a front side from the second position by a predetermined interval for avoiding a collision between the substrate and the arm and a collision between the elevating member and the substrate when the elevating operation ends. If the controller judges that the stage does not reach the fourth position, the controller controls the movements of the stage and the arm, and the elevation of the elevating member so that the arm starts to move toward the second position before the end of the elevating operation.


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