The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2016
Filed:
Aug. 12, 2014
Applicant:
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Inventor:
Takehiro Kondoh, Yokkaichi, JP;
Assignee:
KABUSHIKI KAISHA TOSHIBA, Minato-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/168 (2013.01); G03F 7/20 (2013.01); H01L 21/0273 (2013.01); H01L 21/0274 (2013.01);
Abstract
A pattern formation method according to the present embodiment includes forming a resist film on a treatment target material. The resist film is processed into resist patterns. A cross-link film or a coating agent protecting the resist film is coated onto the resist film. A self-organizing material is applied onto the resist film having the cross-link film or the coating agent coated thereon. The self-organizing material is thermally treated to achieve phase separation. A part of the self-organizing material which has been phase-separated is removed.