The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2016
Filed:
May. 16, 2013
Applicant:
Incoatec Gmbh, Geesthacht, DE;
Inventors:
Assignee:
incoatec GmbH, Geesthacht, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 1/02 (2006.01); G21K 1/04 (2006.01); A61B 6/06 (2006.01); G01N 23/20 (2006.01); G02B 26/00 (2006.01); G02B 26/08 (2006.01); G02B 27/09 (2006.01); G01N 23/201 (2006.01); G01N 23/207 (2006.01);
U.S. Cl.
CPC ...
G01N 23/20008 (2013.01); G02B 26/001 (2013.01); G21K 1/02 (2013.01); G21K 1/04 (2013.01); A61B 6/06 (2013.01); G01N 23/201 (2013.01); G01N 23/207 (2013.01); G02B 26/0808 (2013.01); G02B 27/0988 (2013.01); G21K 1/046 (2013.01);
Abstract
An X-ray analysis apparatus has at least one X-ray aperture () which delimits an X-ray beam (RS) emitted by an X-ray source (). The at least one X-ray aperture () is disposed at a separation from the sample () and has a single crystal aperture body () with a through pinhole (). The single crystal aperture body () forms a peripheral continuous edge () which delimits the X-ray beam (RS) and starting from which the pinhole () widens like a funnel in a direction of an outlet opening () of the X-ray aperture () in a first area (B). The X-ray analysis apparatus reduces impairment of X-ray measurements due to parasitic scattered radiation and at little expense.