The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2016
Filed:
Jun. 07, 2007
Applicant:
Jean-michel Rius, Octeville sur Mer, FR;
Inventor:
Jean-Michel Rius, Octeville sur Mer, FR;
Assignee:
SIDEL PARTICIPATIONS, Octeville sur Mer, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01L 27/02 (2006.01); C23C 16/04 (2006.01); C23C 16/511 (2006.01); C23C 16/54 (2006.01); H01J 37/32 (2006.01); B05D 1/00 (2006.01); B05D 7/22 (2006.01);
U.S. Cl.
CPC ...
C23C 16/045 (2013.01); C23C 16/511 (2013.01); C23C 16/54 (2013.01); H01J 37/32192 (2013.01); B05D 1/62 (2013.01); B05D 7/227 (2013.01);
Abstract
A machine for plasma treatment of containers, including a chamber for receiving a container to be treated, the chamber connected to a primary vacuum circuit. A pressure sensor is connected to the chamber. There is a first mechanism for communicating the pressure sensor with the chamber; a secondary vacuum circuit dependent on the first circuit and connected to the pressure sensor; and second mechanism for communicating the pressure sensor with the secondary vacuum circuit.