The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2016

Filed:

Jun. 09, 2011
Applicants:

Yong-sup Choi, Yongin, KR;

Myeng-woo Nam, Yongin, KR;

Inventors:

Yong-Sup Choi, Yongin, KR;

Myeng-Woo Nam, Yongin, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 33/00 (2010.01); B05C 11/10 (2006.01); C23C 14/04 (2006.01); C23C 14/24 (2006.01); C23C 14/50 (2006.01); C23C 14/54 (2006.01); C23C 14/56 (2006.01);
U.S. Cl.
CPC ...
C23C 14/044 (2013.01); C23C 14/24 (2013.01); C23C 14/50 (2013.01); C23C 14/544 (2013.01); C23C 14/56 (2013.01);
Abstract

A thin film deposition apparatus includes: a deposition source for discharging a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and having a plurality of patterning slits arranged in the first direction; a barrier plate assembly including a plurality of barrier plates that are disposed between the deposition source nozzle unit and the patterning slit sheet in the first direction, the plurality of barrier plates partitioning a deposition space between the deposition source nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces; and a capacitive vacuum gauge disposed at a side of the deposition source and configured to measure a pressure inside the deposition source.


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