The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2016

Filed:

Jan. 31, 2012
Applicants:

Sang-min Park, San Jose, CA (US);

Nobuo Kurataka, Campbell, CA (US);

Gennady Gauzner, San Jose, CA (US);

Inventors:

Sang-Min Park, San Jose, CA (US);

Nobuo Kurataka, Campbell, CA (US);

Gennady Gauzner, San Jose, CA (US);

Assignee:

Seagate Technology Inc., Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B82Y 40/00 (2011.01); G03F 7/00 (2006.01); B82Y 10/00 (2011.01); B05D 3/12 (2006.01); B05D 3/10 (2006.01);
U.S. Cl.
CPC ...
B82Y 40/00 (2013.01); B82Y 10/00 (2013.01); G03F 7/0002 (2013.01); B05D 3/10 (2013.01); B05D 3/12 (2013.01); Y10T 428/24802 (2015.01);
Abstract

The embodiments disclose a method of surface tension control to reduce trapped gas bubbles in an imprint including modifying chemistry aspects of interfacial surfaces of an imprint template and a substrate to modify surface tensions, differentiating the interfacial surface tensions to control interfacial flow rates of a pre-cured liquid resist and controlling pre-cured liquid resist interfacial flow rates to reduce trapping gas and prevent trapped gas bubble defects in cured imprinted resist.


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