logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9275850 B1

PDFFull Text
Expired
Date of Patent:
Mar. 01, 2016

Filed:

Jul. 29, 2013

Method for cleaning wafers using a polycarboxylate solution

Applicant:

Fontana Technology, Campbell, CA (US);

Inventor:

Mark Jonathan Beck, Los Gatos, CA (US);

Assignee:

Fontana Technology, Campbell, CA (US);

Attorney:

Donald J. Pagel

Primary Examiner:

Binh X Tran

Assistant Examiner:

David Cathey, Jr

Int. Cl.
CPC ...
B08B 3/14 (2006.01); H01L 21/02 (2006.01); C07C 211/63 (2006.01); C08F 20/06 (2006.01); C08F 26/00 (2006.01); C11D 3/37 (2006.01); C11D 7/06 (2006.01); C11D 7/26 (2006.01); C11D 7/32 (2006.01); C11D 11/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02057 (2013.01); C07C 211/63 (2013.01); C08F 20/06 (2013.01); C08F 26/00 (2013.01); C11D 3/3723 (2013.01); C11D 3/3765 (2013.01); C11D 7/06 (2013.01); C11D 7/265 (2013.01); C11D 7/3209 (2013.01); C11D 7/3227 (2013.01); C11D 11/0047 (2013.01);
Abstract

A cleaning solution and method for removing submicron particles from the surface of an electronic substrate such as a semiconductor wafer. The cleaning solution comprises a polycarboxylate polymer, a base and water. The method comprises the step of contacting a surface of the substrate with a cleaning solution comprised of the polycarboxylate polymer. Additional optional steps in the method include applying acoustic energy to the cleaning solution and/or rinsing the surface with a rinsing solution with or without the application of acoustic energy to the rinsing solution.

Find Patent Forward Citations

Beck, Mark. (2016). Method for cleaning wafers using a polycarboxylate solution (U.S. Patent No. 9275850). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9275850

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…