The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2016

Filed:

Feb. 06, 2012
Applicants:

Osamu Furuhashi, Uji, JP;

Junichi Taniguchi, Kyoto, JP;

Inventors:

Osamu Furuhashi, Uji, JP;

Junichi Taniguchi, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/06 (2006.01); H01J 49/40 (2006.01);
U.S. Cl.
CPC ...
H01J 49/067 (2013.01); H01J 49/401 (2013.01);
Abstract

An electrostatic lens (), including five cylindrical electrodes (-) arrayed along an ion-optical axis (C) and an aperture plate () located on a common focal plane of two virtual convex lenses (Land L) formed under an afocal condition, is used as an ion-injecting optical system for sending ions into an orthogonal acceleration unit. The diameter of a restriction aperture () formed in the aperture plate () determines the angular spread of an exit ion beam. When voltages for making the electrostatic lens () function as an afocal system are set, a measurement with high mass-resolving power can be performed at a slight sacrifice of the sensitivity. When voltages for making the lens function as a non-afocal system having the highest ion-passage efficiency are set, a measurement with high sensitivity can be performed at a slight sacrifice of the resolving power.


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