The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9275817 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 01, 2016

Filed:

Mar. 23, 2013
Applicant:

Frederick Wight Martin, North Stratford, NH (US);

Inventor:

Frederick Wight Martin, North Stratford, NH (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/145 (2006.01); H01J 3/22 (2006.01); H01J 37/141 (2006.01); H01J 37/153 (2006.01); H01J 3/12 (2006.01);
U.S. Cl.
CPC ...
H01J 3/22 (2013.01); H01J 3/12 (2013.01); H01J 37/141 (2013.01); H01J 37/145 (2013.01); H01J 37/153 (2013.01); H01J 2237/04926 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/31749 (2013.01);
Abstract

An objective lens for use in probe-forming particle-optical columns such as focused ion beam equipment, scanning electron microscopes, and helium microscopes is described. It comprises two interleaved (quadrupole/octopole) lenses and two or three ancillary octopole lenses, and is capable of simultaneous compensation of spherical (Cs) and chromatic (Cc) aberrations of the objective lens alone or of the complete particle-optical column. Additional apparatus comprising a gridded aperture and position-sensitive detector is specified, together with a method to measure and minimize all of the five independent third-order aberration coefficients of the objective lens.


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