The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2016

Filed:

Sep. 16, 2014
Applicant:

Nen-chin Liu, Wellington, FL (US);

Inventor:

Nen-Chin Liu, Wellington, FL (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G08B 13/14 (2006.01); G08B 13/24 (2006.01);
U.S. Cl.
CPC ...
G08B 13/2442 (2013.01); G08B 13/2405 (2013.01); G08B 13/2408 (2013.01);
Abstract

Systems () and methods () for making a marker. The methods comprise: obtaining a resonator material which has been annealed under a tensile force selected to provide a maximum resonant amplitude at a bias field Hin the marker; and providing with the bias material of the marker an operating bias field Hwith a value less than a value of said bias field H. The value of His reduced by performing at least one of the following operations: selectively modifying a geometry of a bias material which is to be disposed in a housing of the marker; selectively modifying a spacing between the resonator material and the bias material arranged in a stacked configuration; and partially de-gaussing the bias material subsequent to being fully saturated.


Find Patent Forward Citations

Liu, Nen-Chin. (2016). Enhanced signal amplitude in acoustic-magnetomechanical eas marker (U.S. Patent No. 9275529). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9275529

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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