The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2016

Filed:

Sep. 14, 2012
Applicants:

Farrel Martin, Waldorf, MD (US);

Alberto Píqué, Crofton, MD (US);

Raymond C Y Auyeung, Alexandria, VA (US);

Steve Policastro, Waldorf, MD (US);

Inventors:

Farrel Martin, Waldorf, MD (US);

Alberto Píqué, Crofton, MD (US);

Raymond C Y Auyeung, Alexandria, VA (US);

Steve Policastro, Waldorf, MD (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2002 (2013.01); G03F 7/2053 (2013.01); G03F 7/26 (2013.01); Y10T 428/13 (2015.01);
Abstract

A method for isolating microstructural regions or features on a surface for electrochemical experimentation comprising polishing a metal sample, coating the metal sample with a photoresist, selecting a region of interest of the metal sample, exposing the region of interest with light energy, developing the exposed photoresist and creating a developed region.


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