The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2016

Filed:

Mar. 31, 2014
Applicants:

Gary Alan Kneezel, Webster, NY (US);

Todd Mathew Spath, Hilton, NY (US);

Inventors:

Gary Alan Kneezel, Webster, NY (US);

Todd Mathew Spath, Hilton, NY (US);

Assignee:

EASTMAN KODAK COMPANY, Rochester, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 31/308 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/20 (2013.01);
Abstract

A system for determining an alignment location associated with a pattern formed on a substrate is disclosed. Electrical measurements are made as the substrate is moved along an advancement direction. An alignment structure is formed on the substrate. The alignment structure has a first member extending along a first direction that is not parallel to the advancement direction and a second member extending along a second direction that is not parallel to either the advancement direction or to the first member. The first member and the second member are electrically conductive and substantially transparent. One or more probes are used to identify portions of the first and second members of the alignment structure and produce signals in response to relative motion between the substrate and the probes. A controller, responsive to signals produced by the probe, determines an alignment location associated with the pattern formed on the substrate.


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