The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2016

Filed:

Jan. 29, 2015
Applicant:

Heptagon Micro Optics Pte. Ltd., Singapore, SG;

Inventors:

Markus Rossi, Jona, CH;

Hans Peter Herzig, Neuchâtel, CH;

Philipp Müller, Oberrieden, CH;

Ali Naqavi, Neuchâtel, CH;

Daniel Infante Gómez, Neuchâtel, CH;

Moshe Doron, San Francisco, CA (US);

Matthias Gloor, Boswil, CH;

Alireza Yasan, San Jose, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 5/00 (2015.01); F21V 5/02 (2006.01); F21Y 101/02 (2006.01);
U.S. Cl.
CPC ...
F21V 5/007 (2013.01); F21V 5/02 (2013.01); F21Y 2101/02 (2013.01); F21Y 2101/025 (2013.01);
Abstract

An apparatus for producing structured light comprises a first optical arrangement which comprises a microlens array comprising a multitude of transmissive or reflective microlenses which are regularly arranged at a lens pitch P and an illumination unit for illuminating the microlens array. The illumination unit comprises an array of light sources for emitting light of a wavelength L each and having an aperture each, wherein the apertures are located in a common emission plane which is located at a distance D from the microlens array. For the lens pitch P, the distance D and the wavelength L, the following equation applies=2wherein N is an integer with N≧1. High-contrast high-intensity light patterns can be produced.


Find Patent Forward Citations

Loading…