The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2016

Filed:

Sep. 30, 2010
Applicants:

Masamichi Tanaka, Tokyo, JP;

Atsushi Kishimoto, Tokyo, JP;

Tadashi Neya, Tokyo, JP;

Keita Ishizaki, Utsunomiya, JP;

Inventors:

Masamichi Tanaka, Tokyo, JP;

Atsushi Kishimoto, Tokyo, JP;

Tadashi Neya, Tokyo, JP;

Keita Ishizaki, Utsunomiya, JP;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F01N 3/022 (2006.01); B01D 46/24 (2006.01);
U.S. Cl.
CPC ...
F01N 3/0222 (2013.01); B01D 2046/2437 (2013.01); B01D 2275/30 (2013.01); B01D 2279/30 (2013.01); Y02T 10/20 (2013.01);
Abstract

According to the present invention, there is provided an exhaust gas purifying filter capable of effectively removing collected particulate matter. An exhaust gas purifying filter of the present invention includes an inflow surface into which exhaust gas including particulate matter flows, an exhaust surface which exhausts purified gas, and a filter substrate which is constructed of a porous body, wherein the filter substrate includes porous partitions and gas passages which are enclosed by the partitions, and a porous film, which includes silicon carbide and pores having a smaller pore diameter than the pores of the partitions, is provided on the surface of the partitions, and a silicon dioxide layer is formed on at least an outer surface portion of the porous film.


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