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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9273209 B1

PDFFull Text
Date of Patent:
Mar. 01, 2016

Filed:

Nov. 28, 2008

Siloxane polymer compositions

Applicants:

Ari Kärkkäinen, Oulu, FI;

Milja Hannu-kuure, Oulu, FI;

Sacha Legrand, Oulu, FI;

Admir Hadzic, Oulu, FI;

Graeme Gordon, Oulu, FI;

Inventors:

Ari Kärkkäinen, Oulu, FI;

Milja Hannu-Kuure, Oulu, FI;

Sacha Legrand, Oulu, FI;

Admir Hadzic, Oulu, FI;

Graeme Gordon, Oulu, FI;

Assignee:

Braggone Oy, Oulu, FI;

Attorney:

McCormick, Paulding & Huber LLP

Primary Examiner:

Sin Lee

Int. Cl.
CPC ...
C08L 83/06 (2006.01); C08L 83/08 (2006.01); G03F 7/075 (2006.01); G03F 7/004 (2006.01); C08G 77/06 (2006.01); C08G 77/16 (2006.01); C08G 77/26 (2006.01); C08G 77/28 (2006.01); C08G 77/32 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); C08K 5/00 (2006.01); G03F 7/00 (2006.01); C08G 77/14 (2006.01); C08G 77/20 (2006.01); C08G 77/00 (2006.01);
U.S. Cl.
CPC ...
C08L 83/06 (2013.01); C08G 77/06 (2013.01); C08G 77/14 (2013.01); C08G 77/16 (2013.01); C08G 77/20 (2013.01); C08G 77/26 (2013.01); C08G 77/28 (2013.01); C08G 77/32 (2013.01); C08G 77/80 (2013.01); C08K 5/0025 (2013.01); C08L 83/08 (2013.01); G03F 7/004 (2013.01); G03F 7/0007 (2013.01); G03F 7/0757 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01);
Abstract

A siloxane composition and a method of producing the same. The composition comprises a siloxane prepolymer with a backbone exhibiting a group which is capable of being deprotonated in an aqueous base solution. Further, there are reactive functional groups, which are capable of reacting during thermal or radiation initiated curing. The siloxane is cross-linked during condensation polymerization to increase molecular weight thereof. The composition can be used in high-resolution negative tone lithographic fabrication processes where a water based developer system is applied in the development step of the lithography process.

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